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Rapid Thermal Processing and beyond: Applications in Semiconductor Processing

Materials Science Forum Volumes 573 - 574

• Papers
• Abstracts

• p3 The Expanding Role of Rapid Thermal Processing in CMOS Manufacturing   [ 574 K ]
  Authors: Jim Nakos, Joe Shepard
• p21 Evolution of Commercial RTP Modules   [ 234 K ]
  Authors: Bruce Peuse
• p35 Fast Diffusion in Germanium and Silicon Investigated by Lamp-Based Rapid Thermal Annealing   [ 270 K ]
  Authors: Nicolaas Stolwijk, Ludmila Lerner, Axel Giese, Wilfried Lerch
• p45 Rapid Thermal Processing and the Control of Oxygen Precipitation Behaviour in Silicon Wafers   [ 932 K ]
  Authors: Robert Falster, Vladimir Voronkov
• p61 High Temperature RTP Application in SOI Manufacturing   [ 1 M ]
  Authors: Christophe Maleville, Eric Neyret, Daniel Delprat, Ludovic Ecarnot
• p77 Cleaning of Silicon Surfaces for Nanotechnology   [ 8 M ]
  Authors: Oliver Senftleben, Hermann Baumgärtner, Ignaz Eisele
• p119 Heavy Water in Gate Stack Processing   [ 671 K ]
  Authors: Andrea E. Pap, Csaba Dücső, Katalin Kamarás, Gábor Battistig, István Bársony
• p133 Advanced Gate Dielectric Development for VLSI Technology   [ 355 K ]
  Authors: Yi Ma
• p147 A Growth Kinetics Model for the Radical Oxidation of Silicon   [ 197 K ]
  Authors: Olaf Storbeck, Wieland Pethe, Regina Hayn
• p153 Investigation of Ultra Thin Thermal Nitrided Gate Dielectrics in Comparison to Plasma Nitrided Gate Dielectrics for High-Performance Logic Application for 65nm   [ 410 K ]
  Authors: Martin Trentzsch, Christian Golz, Karsten Wieczorek, Rolf Stephan, Tilo Mantei, Boris Bayha, Susanne Ohsiek, Michael Raab, Zsolt Nényei, Wilfried Lerch, Jürgen Niess, Waltraud Dietl, Christoph Kirchner, Georg Roters